Su-PS4-Sy84
Log Number: P102
Abstract Submitted to the NT'02-Logo NANOTUBE'02 Workshop:

Low Temperature Synthesis of Carbon Nanofibers by Inductively Coupled Plasma Chemical Vapor Deposition

S. Honda1, T. Ikuno1, H. Furuta3, M. Katayama1, T. Hirao2, and K. Oura1

1Department of Electronic Engineering, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan
2Department of Electrical Engineering, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan
3New Energy and Industrial Technology Development Organization (NEDO), Tokyo 170-6027, Japan

Contact e-mail: honda@ele.eng.osaka-u.ac.jp

We have developed the synthesis method for carbon nanofibers (CNFs), or carbon nanotubes (CNTs) using plasma chemical vapor deposition (CVD). Inductively coupled plasma (ICP) was applied to low temperature growth of CNFs or CNTs. In general, ICP has higher plasma density and higher ion current density compared with RF plasma. Methane gas was introduced into the chamber as a carbon source. Ni film deposited on Si wafer was used as a catalyst. The substrate temperature was varied from 300 to 600 degree C. It was found that synthesis temperature of CNFs was decreased at 400 degree C. The obtained nanofibers were highly aligned and a metallic particle was on the top of each fiber, indicating plasma induced alignment and tip growth mechanism. The results of structural characterizations by SEM and TEM will be discussed as a function of synthesis conditions. This work was performed under the Frontier Carbon Technology Project of the New Energy and Industrial Technology Development Organization.

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